Kevin Walsh

Assoc Dean

Kevin M. Walsh received the B.S. and M.Eng. degrees in electrical engineering from the University of Louisville, Louisville, Kentucky, and the Ph.D. degree in electrical engineering (microelectronics/MEMS) from the University of Cincinnati, Cincinnati, Ohio in 1978, 1985, and 1992, respectively. Dr. Walsh is the Samuel T. Fife Endowed Professor of Electrical and Computer Engineering at the University of Louisville, where he also serves as the founding director of the UofL Micro/NanoTechnology Center (MNTC) and its associated 10,000 sq. ft. class 100 cleanroom facility, which was recently ranked top 10 in the United States by Small Times Magazine. The MNTC has brought in over $55M of research awards into the University of Louisville. In 2008, Dr. Walsh and his team started the "KY nanoNET Initiative" which is an NSF-funded statewide network for the coordination of all the micro and nanotechnology efforts in the Commonwealth. Prof. Walsh is also on the editorial board of Sensor Letters, the Review Board for the Oak Ridge National Laboratory CNMS (Center for Nanophase Materials Science) User Program, and the RSL Advisory Board for the National Nanotechnology Initiative (NNI) which reports to the Executive Office of the President of the United States. He served as the general chair for the 2008 IEEE University/Government/Industry Micro-nano Symposium (UGIM08), is the current conference chair for the 2013 KY NanoSymposium, has 12 awarded patents and is co-founder of 4 technical start-up companies (Assenti, OrthoData Technologies, UltraTrace Detection and Simon Sounds). Prof. Walsh has taught over 20 different courses, advised over 30 completed theses, and published over 150 technical papers in the areas of micro/nanotechnology and MEMS (micro-electro-mechanical systems). Dr. Walsh's research group has received over $35M of external research funding from DoD, DOE, NSF, NASA, NIH and industry. He has twice been presented with the school's top Research Award for the 3-year periods of 1998-2000 and 2007-2009. In 2000, Prof. Walsh was inducted into the Trinity High School Hall of Fame, 2001 into the UofL Athletic Hall of Fame, and in 2005 the Kentucky Tennis Hall of Fame.


  • Ph.D. in Electrical & Computer Engineering, University of Cincinnati, 1992
  • M.Eng. in Electrical Engineering, University of Louisville, 1985
  • B.E. in Electrical Engineering, University of Louisville, 1978


The effects of DRIE operational parameters on vertically aligned micropillar arrays- 2013

Vertically aligned silicon micropillar arrays have been created by deep reactive ion etching (DRIE) and used for a number of microfabricated devices including microfluidic devices, micropreconcentrators and photovoltaic cells. This paper delineates an experimental design performed on the Bosch process of DRIE of micropillar arrays. The arrays are fabricated with direct-write optical lithography without photomask, and the effects of DRIE process parameters, including etch cycle time, passivation cycle time, platen power and coil power on profile angle, scallop depth and scallop peak-to-peak distance are studied by statistical design of experiments. Scanning electron microscope images are used for measuring the resultant profile angles and characterizing the scalloping effect on the pillar sidewalls. The experimental results indicate the effects of the determining factors, etch cycle time, passivation cycle time and platen power, on the micropillar profile angles and scallop depths. An optimized DRIE process recipe for creating nearly 90 degrees and smooth surface (invisible scalloping) has been obtained as a result of the statistical design of experiments.

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